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CVD = Chemical Vapor Deposition
ALD = Atomic Layer Deposition

Development of high-purity precursors for next-generation semiconductors.

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TANAKA has developed various types of chemical vapor deposition (CVD) and atomic layer deposition (ALD) precursors. With CVD systems for producing thin semiconductor films and providing various analyzers data for evaluating thin films(field emission scanning electron microscope [FE-SEM], atomic force microscope [AFM], glow-discharge mass spectrometer [GD-MS], etc.), TANAKA offers precursors that are ideal for a variety of different purposes.

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We develop precursors for precious metals, primarily focusing on ruthenium.

Product Name Structure
Carish Ru liquid precursor
Rudic Ru liquid precursor
DCR Ru solid precursor
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